Data for reference gehrke-unpublished-1

Pendeo-Epitaxy Process for Aluminum Gallium Nitride Thin Films on Silicon Carbide Substrates via Metalorganic Chemical Vapor Deposition,

T. Gehrke, K. J. Linthicum, P. Rajagopal et al

unpub. (1), 0 (2001).

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This item is cited by the following items in the database:

  1. Review of Pendeo-Epitaxial Growth and Characterization of Thin Films of GaN and AlGaN Alloys on 6H-SiC(0001) and Si(111) Substrates

Contributed by A submitted manuscript, on Wednesday, November 7, 2001 6:31:22 PM

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