Data for reference shul-unpublished-1

Selective ICP etching of group III-nitrides in Cl2 andBCl3-based plasmas

R. J. Shul, C. G. Willison, M. M. Bridges, J. Han, J. W. Lee, S. J. Pearton, C. R. Abernathy, J. D. MacKenzie, S. M. Donovan, L. Zhang, L. F. Lester

J. Vac. Sci. Technol. A (1), 0 (1998).

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This item is cited by the following items in the database:

  1. New plasma chemistries for etching GaN and InN: BI3 and BBr3

Contributed by A submitted manuscript, on March 3, 1998 4:59:25 PM

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