Data for reference liu-nimb-148-369

Influence of substrate temperature on damage biulup and removal of ion implanted gallium nitride

C. Liu, A. Wenzel, K. Volz, B. Rauschenbach

Nuclear Instrumentation and Methods B 148, 369 (1999).

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This item is cited by the following items in the database:

  1. Effect Of Implantation Temperature On Damage Accumulation In Ar - Implanted GaN

Contributed by A submitted manuscript, on Tuesday, December 17, 2002 2:52:18 PM

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