Data for reference shul-mrssp-478-208

Selective etching of wide bandgap nitrides

R. J. Shul, C. G. Willison, M. M. Bridges, J. Han, J. W. Lee, S. J. Pearton, C. R. Abernathy, J. D. MacKenzie, S. M. Donovan

Materials Research Society Symposium Proceedings 478, 208 (1998).

This item is cited by the following items in the database:

  1. New plasma chemistries for etching GaN and InN: BI3 and BBr3

Contributed by A submitted manuscript, on February 19, 1998 3:01:47 PM

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