Data for reference powell-mrssp-162-525Growth of high-resistivity wurtzite and zincblende structure single crystal GaN by reactive-ion molecular beam epitaxy
R. C. Powell, G. A. Tomasch, Y.-W. Kim, J. A. Thornton, J. E. Greene
Materials Research Society Symposium Proceedings 162, 525 (1990).
This item is cited by the following items in the database:
- GaN, AlN, and InN: A review
- ScAlMgO4: an Oxide Substrate for GaN Epitaxy
- Inheritance of zinc-blende structure from 3C-SiC/Si(001) substrate in growth of GaN by MOCVD
- GaN films prepared by ECR plasma-assisted deposition
Contributed by S. Strite
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