Data for reference shul-jvstb-13-2016High rate electron cyclotron resonance etching of GaN, InN, and AlN High rate electron cyclotron
resonance
R. J. Shul, A. J. Howard , S. J. Pearton, C. R. Abernathy, C. B. Vartuli , P. A. Barnes, M. J. Bozack
Journal of Vacuum Science and Technology B 13(5), 2016 (1995).
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