Data for reference stevens-jvstb-12-1186Growth of group III nitrides on Si(111) by plasma- assisted molecular beam epitaxy Growth of group
III nitrides on Si(111)
K. S. Stevens, A. Ohtani, A. F. Schwartzman, R. Beresford
Journal of Vacuum Science and Technology B 12(2), 1186 (1994).
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This item is cited by the following items in the database:
- Crystal Morphology and Optical Emissions of GaN layers grown on Si(111) substrates by Molecular Beam Epitaxy
- Nucleation of AlN on the (7×7) Reconstructed Silicon (1 1 1) Surface
Contributed by Andrei Nikolaev from shuttle.ioffe.rssi.ru
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