Data for reference tempez-jvsta-17-2209

Photoenhanced reactive ion etching of III-V nitrides in BCl3/Cl2/Ar/N2 plasmas

A Tempez , N Medelci, N Badi, I Berishev, D Starikov, A Bensaoula

Journal of Vacuum Science and Technology A-Vacuum Surfaces and Films 17(4), 2209 (1999).

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This item is cited by the following items in the database:

  1. Effect of Photo-Assisted RIE Damage on GaN

Contributed by A submitted manuscript, on Monday, September 29, 2003 5:55:42 PM

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