Data for reference aita-jvsta-1-403

The dependence of aluminum nitride film crystallography on sputtering plasma composition

C. R. Aita, C. J. Gawlak

Journal of Vacuum Science and Technology A-Vacuum Surfaces and Films 1, 403 (1983).

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This item is cited by the following items in the database:

  1. GaN, AlN, and InN: A review

Contributed by S. Strite

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