Data for reference lin-jjap-36-l598Crystalline Structure changes in GaN Films Grown at Different Temperatures
H. Lin, J. Ou, Wei-Kuo Chen, Wen-Hsiung Chen, Ming-Chih Lee
Japanese Journal of Applied Physics 36(5B), L598 (1997).
This item cites the following items in the database:
- High quality AlN and GaN epilayers grown on (00.1) sapphire, (100), and (111) silicon substrates
- The Role of the Low Temperature Buffer Layer and Layer Thickness in the Optimization of OMVPE Growth of GaN on Sapphire
- Analysis of two-step-growth conditions for GaN on an AlN buffer layer
- Photoluminescence investigation of GaN films grown by metalorganic chemical vapor deposition on
(100) GaAs
- Basic Studies of Gallium Nitride Growth on Sapphire by Metalorganic Chemical Vapor Deposition and Optical Properties of Deposited Layers
- Optical properties and temperature dependence of the interband transitions of cubic and hexagonal
GaN
- GaN Growth Using GaN Buffer Layer
- Mechanism of yellow luminescence in GaN
- Optically detected magnetic resonance of GaN films grown by organometallic chemical-vapor
deposition
- Fundamental optical transitions in GaN
- Donor-acceptor pair recombination in GaN
- Investigation of longitudinal-optical phonon-plasmon coupled modes in highly conducting bulk GaN
- Comparative Raman studies of cubic and hexagonal GaN epitaxial layers
- Quantitative determination of hexagonal minority phase content in cubic GaN using Raman spectroscopy
- Influence of moisture and oxygen on the formation of cubic phase GaN in halide vapor phase epitaxial growth
- Heteroepitaxy, polymorphism, and faulting in GaN thin films on silicon and sapphire substrates
Contributed by S. Strite from internet-gateway-x.zurich.ibm.com. on Tuesday, June 24, 1997 9:08:57 AM
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