Data for reference nakamura-jjap-35-l74InGaN-Based Multi-Quantum-Well-Structure Laser Diodes
S Nakamura, M Senoh, S Nagahama, N Iwasa, T Yamada, T Matsushita, H Kiyoku, Y Sugimoto
Japanese Journal of Applied Physics 35(1B), L74 (1996).
InGaN multi-quantum-well (MQW) structure laser dioded (LDs) fabricated
from III-V nitride materials were grown by metalorganic chemical vapor
deposition on sapphire substrates. The mirror facet for a laser cavity
was formed by etching of III-V nitride films without cleaving. As an
active layer, the InGaN MQW structure was used. The InGaN MQW LDS
produced 215 mW at a forward current of 2.3 A, with a sharp peak of
light output at 417 nm that had a full width at half-maximum of
1.6 nm under the pulsed current injection at room temperature.
The laser threshold current density was 4 kA/cm2. The emission
wavelength is the shortest one ever generated by a semiconductor
laser diode.
This item is cited by the following items in the database:
- The Morphology and Cathodoluminescence of
GaN Thin Films
- The Growth of InGaN/(Al)GaN Quantum Well Structures in a Multi-Wafer High
Speed Rotating Disk Reactor
- ECR RIE-Enhanced Low Pressure Plasma Etching of GaN/InGaN/AlGaN
Heterostructures
- Evidence for Shallow Acceptor Levels in MBE Grown GaN
- Fabrication of GaN mesa structures
- Growth of GaN films on (0 0 1) and (1 1 1) GaAs surfaces
by a modified MBE method
- Room Temperature pulsed operation of nitride based MQW laser diodes with cleaved facets on conventional c-face sapphire substrates
- Room Temperature CW Operation of InGaN MQW Structure Laser Diodes
- Etching processes for fabrication of GaN/InGaN/AlN microdisk laser structures
- Characteristics Of Room Temperature-CW Operated InGaN
Multi-Quantum-Well-Structure Laser Diodes
- The
Composition Pulling Effect in MOVPE Grown InGaN on GaN and AlGaN and its TEM
Characterization
- Nonuniform Morphology and Luminescence Properties of a Molecular Beam
Epitaxy GaN Film from Atomic Force Microscopy, Scanning Electron Microscopy and
Cathodoluminescence
- MOVPE of Thick InGaN on Sapphire Substrate
- Degenerate Layer at GaN/sapphire interface: Influence on Hall-effect measurements
- Characterization of InGaN MQW structures for blue semiconductor laser diodes
- Urbach-Martienssen tails in a wurtzite GaN epilayer
- Electron cyclotron resonance etching of III–V nitrides in IBr/Ar plasmas
- Studies of Mg-GaN grown by MBE on GaAs(111)B substrates
- Dispersion properties of aluminum nitride as measured by an optical waveguide technique
- A Perspective on the GaN Injection Laser
- AlGaN-Based Bragg Reflectors
- Properties of the Biexciton and the Electron-Hole-Plasma in Highly
Excited GaN
- Fundamentals, Material Properties and Device Performances in GaN MBE using On-Surface Cracking of Ammonia
- Physical Properties of Bulk GaN Crystals Grown by HVPE
- Time-resolved
photoluminescence studies of InGaN/GaN multiple quantum wells
- Electron Beam Pumped MQW InGaN/GaN Laser
- Surface Treatment and Layer Structure in 2H-GaN Grown on the (0001)Si surface of 6H-SiC by MBE
- Effects of proton irradiation on AlGaN/InGaN/GaN green light emitting diodes
- Gain spectra and stimulated emission in epitaxial (In,Al) GaN thin films
- Growth of Ga1-xBxN by Molecular Beam Epitaxy
- Electron Overflow to the AlGaN p-Cladding Layer in InGaN/GaN/AlGaN MQW Laser Diodes
- Defect structure in selectively grown GaN films with low threading dislocation density
- New plasma chemistries for etching GaN and InN: BI3 and BBr3
- Electronic band structures and effective-mass parameters of wurtzite GaN and InN
- Threshold currents of nitride vertical-cavity surface-emitting lasers with various active regions
- On the Bandstructure in GaInN/GaN Heterostructures - Strain, Band Gap and Piezoelectric Effect
- Characteristic of InGaN/GaN Laser Diode Grown by a Multi-Wafer MOCVD System
- Dislocation Density of GaN Grown by Hydride Vapor Phase Epitaxy
- Free excitons in strained MOCVD-grown GaN layers
Contributed by Carol Trager-Cowan from cowan-physics.phys.strath.ac.uk. on Thursday, May 30, 1996 5:09:53 PM
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