Japanese Journal of Applied Physics 35(11B), L1480 (1996).
The surface morphology of hexagonal (h-) GaN layers grown by hydride vapor phase epitaxy on GaAs (100) substrates with several misorientation angles and directions was estimated. The surface morphology od the h-GaN epitaxial layers was very rough on GaAs (100)exact stbstrates and GaAs (100) substrates misoriented toward the [111]A direction. The morphology was greatly improved on GaAs (100) substrates misoriented toward the [111]B direction, depending on the misorientation angles. The best surface morphology in our experiment was obtained on GaAs (100) substrates misoriented by 15.8¡ toward the [111]B direction. It was also found that a Ga-rich surface was favorable for GaN growth with good morphology.
Contributed by Tohru HONDA from vcsel16.pi.titech.ac.jp. on Thursday, January 30, 1997 6:22:56 AM
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