Data for reference cho-jjap-34-l236Epitaxial Growth of GaN on Sapphire (0001) Substrates by Electron Cyclotron Resonance Molecular Beam Epitaxy
SH Cho, H Sakamoto, K Akimoto, Y Okada, M Akimoto
Japanese Journal of Applied Physics 34, L236 (1995).
This item is cited by the following items in the database:
- Theoretical Model for Analysis and Optimization of Group III-Nitrides Growth
by Molecular Beam Epitaxy
- Homoepitaxial growth of GaN under Ga-stable and N-stable conditions by plasma-assisted molecular beam epitaxy
Contributed by Sergei Yu. Karpov from sunphys.ioffe.rssi.ru. on Wednesday, May 22, 1996 6:04:17 AM
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