Data for reference cho-jjap-34-l236

Epitaxial Growth of GaN on Sapphire (0001) Substrates by Electron Cyclotron Resonance Molecular Beam Epitaxy

SH Cho, H Sakamoto, K Akimoto, Y Okada, M Akimoto

Japanese Journal of Applied Physics 34, L236 (1995).

This item is cited by the following items in the database:

  1. Theoretical Model for Analysis and Optimization of Group III-Nitrides Growth by Molecular Beam Epitaxy
  2. Homoepitaxial growth of GaN under Ga-stable and N-stable conditions by plasma-assisted molecular beam epitaxy

Contributed by Sergei Yu. Karpov from sunphys.ioffe.rssi.ru. on Wednesday, May 22, 1996 6:04:17 AM


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