Data for reference someno-jjap-30-1792

Preparation of AlN-Al2O3 composite films by microwave plasma chemical vapor deposition

Y. Someno, M. Sasaki, T. Hirai

Japanese Journal of Applied Physics 30, 1792 (1991).

This item is cited by the following items in the database:

  1. GaN, AlN, and InN: A review

Contributed by S. Strite

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