Data for reference sato-jap-78-2123

Plasma-assisted low-pressure metalorganic chemical vapor deposition of GaN on GaAs substrates

Michio Sato

Journal of Applied Physics 78(3), 2123 (1995).

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This item is cited by the following items in the database:

  1. Epitaxial Growth of InN by Plasma-assisted MOCVD

Contributed by Andrei Nikolaev from shuttle.ioffe.rssi.ru

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