Data for reference itoh-jap-63-1486

A new technique for crystallographic characterization of heteroepitaxial crystal films

Nobuo Itoh, Keiichi Okamoto

Journal of Applied Physics 63(5), 1486 (1988).

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This item is cited by the following items in the database:

  1. Halide vapor phase epitaxy of gallium nitride films on sapphire and silicon substrates.

Contributed by Andrei Nikolaev from shuttle.ioffe.rssi.ru

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