Data for reference tansley-jap-59-3241Optical band gap of indium nitride
T. L. Tansley, C. P. Foley
Journal of Applied Physics 59, 3241 (1986).
The Materials Research Society does not yet have permission from the copyright owner to make the abstract available.
This item is cited by the following items in the database:
- GaN, AlN, and InN: A review
- Growth of InN by chloride-transport VPE
- The Rate of Radiative Recombination in the Nitride Semiconductors and Alloys
- Influence of growth rates on properties of InN thin films
- InN thin film growth using N2, NH3 and N2-He rf plasma
- Epitaxial Growth of InN by Plasma-assisted MOCVD
- Electronic band structures and effective-mass parameters of wurtzite GaN and InN
- On the Bandstructure in GaInN/GaN Heterostructures - Strain, Band Gap and Piezoelectric Effect
Contributed by S. Strite
If you are a registered user, and would like to help the journal improve
its references database, you can help by adding data to the database. The author list may be incomplete; the abstract
or title may be missing, and the list of references cited by the article is probably absent or incomplete.

last updated Wednesday, May 4, 2005 11:36:22 AM.
© 1998 The Materials Research Society