Electronics Letters 34(17), 1699 (1998).
We report on the impact ionization in AlGaN-GaN Heterostructure Field Effect Transistors grown on sapphire substrates. The measured characteristic electric field of the impact ionization is approximately 2.8-3.15 MV/cm at room temperature. This result is in a good agreement with the theoretical predictions for the breakdown field in GaN and with our recent results for AlGaN-GaN HFETs on 6H-SiC substrates
Contributed by Remis Gaska from remis.apaoptics.com. on Friday, December 18, 1998 4:47:01 PM
last updated Thursday, April 28, 2005 10:22:15 AM.
© 1998 The Materials Research Society