Data for reference tews-electronlett-32-2004Blue and green electroluminescence from MBE grown GaN/InGaN heterostructures
H. Tews, R. Averbeck, A. Graber, H. Riechert
Electronics Letters 32(21), 2004 (1996).
Fabrication of p-n junctions is reported for GaN/InGaN grown by
molecular beam epitaxy using an RF plasma source. Peak
electroluminescence
was observed at 513 nm with an In mole fraction of .27 in the active
layer and 470 nm for a device where the In mole fraction was 0.4.
This item cites the following items in the database:
- Characteristics of light-emitting diodes based on GaN p-n junctions grown by plasma-assisted molecular beam epitaxy
- Free and bound excitons in thin wurtzite GaN layers on sapphire
This item is cited by the following items in the database:
- Homoepitaxial growth of GaN under Ga-stable and N-stable conditions by plasma-assisted molecular beam epitaxy
Contributed by D.E. Crawford from macenroe.fysel.unit.no. on Thursday, February 20, 1997 10:25:31 AM
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