Data for reference thon-apl-69-55

High temperature adduct formation of trimethylgallium and ammonia

A. Thon, T. F. Kuech

Applied Physics Letters 69(1), 55 (1996).

The Materials Research Society does not yet have permission from the copyright owner to make the abstract available.

This item is cited by the following items in the database:

  1. The role of gaseous species in group-III nitride growth
  2. Modeling of InGaN MOVPE in AIX 200 Reactor and AIX 2000 HT Planetary Reactor
  3. Novel approach to simulation of group-III nitrides growth by MOVPE

Contributed by Andrej E. Nikolaev from shuttle.ioffe.rssi.ru. on Sunday, June 30, 1996 7:36:30 AM
Modified by Andrei Nikolaev from shuttle.ioffe.rssi.ru


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