Data for reference lester-apl-69-2737

Nonalloyed Ti/Al Ohmic contacts to n-type GaN using high-temperature premetallization anneal

LF Lester, JM Brown, JC Ramer, L Zhang, SD Hersee, JC Zolper

Applied Physics Letters 69(18), 2737 (1996).

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This item is cited by the following items in the database:

  1. Interfacial Reactions and Electrical Properties of Ti/n-GaN Contacts

Contributed by Holger Cordes from f209-072.net.wisc.edu. on Thursday, December 12, 1996 7:54:50 PM

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