Data for reference ruvimov-apl-69-1556Microstructure of Ti/Al and Ti/Al/Ni/Au contacts for n-GaN
S Ruvimov, Z Liliental-Weber, J Washburn, KJ Duxstad, EE Haller, Z-F Fan, SN Mohammad, W Kim, AE Botchkarev, H Morkoc
Applied Physics Letters 69(11), 1556 (1996).
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This item is cited by the following items in the database:
- Interfacial Reactions and Electrical Properties of Ti/n-GaN Contacts
- Room Temperature Ohmic contact on n-type GaN using plasma treatment
Contributed by Holger Cordes from f183-210.net.wisc.edu. on Tuesday, December 10, 1996 8:51:01 PM
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