Data for reference vartuli-apl-69-1426

ICl/Ar electron cyclotron resonance plasma etching of III-V nitrides

CB Vartuli, SJ Pearton, JW Lee, J Hong, JD MacKenzie, CR Abernathy, RJ Shul

Applied Physics Letters 69(10), 1426 (1996).

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This item is cited by the following items in the database:

  1. Electron cyclotron resonance etching of III–V nitrides in IBr/Ar plasmas
  2. New plasma chemistries for etching GaN and InN: BI3 and BBr3

Contributed by A.E. Nikolaev from 194.85.224.35 on Sunday, October 13, 1996 1:06:14 PM

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