At the SPIE meeting in San Jose on January 29, 1996, the technical
community had its first chance to discuss the very impressive GaN based laser diode
results with Dr. Shuji Nakamura. Many questions were raised
in our discussions and we would like to propose the following
topics for an open discussion on the MRS internet journal.
What are the major factors limiting the achievement of CW
operation? P-contact resistance is certainly causes an
unnecessary large forward voltage drop (30V), but what other
issues remain?
Why did Nakamura start with 26 quantum wells in his first
reported laser?
What is the gain per InGaN well at threshold? Any
estimates for gain of these materials at current densities of
4kA/cm2 for 7 quantum wells?
Do we really need GaN and/or SiC substrates for CW
operation?
How hot is the junction temperature for a laser operating at
these high forward voltage and 2 Amps for 1 microsecond
pulses?
What is the real reflectivity of a rough RIE facet (500Å)
with 70% coating? What might provide better mirrors or facet
formation techniques?
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Page last updated Monday, March 4, 1996 10:19:05 AM.