Electron Beam Bombardment Induced Decrease of Cathodoluminescence Intensity from GaN Not Caused by Absorption in Buildup of Carbon Contamination


Eva M. Campo , G. S. Cargill III
Lehigh University

Milan Pophristic
EMCORE Corporation

Ian Ferguson
Georgia Institute of Technology

This article was received on Thursday, July 1, 2004 and accepted on Tuesday, November 30, 2004.

Abstract

Monochromatic CL imaging, CL spectra, WDS spectra, and EDS spectra and imaging demonstrate that electron beam bombardment of LEO-GaN causes decrease of near band edge cathodoluminescence intensity that cannot be attributed to absorption in a growing carbon contamination layer. An alternative explanation is needed, such as generation of defects, or charge injection and buildup of internal electric fields, caused by electron beam bombardment.

Outline

  • Introduction
  • Experimental
  • Influence of handling methods on sample contamination
  • Contamination in the CL system
  • Effect of carbon absorption on NBE and DL luminescence
  • Conclusions
  • Linked Pages

    Cite this article as: MRS Internet J. Nitride Semicond. Res. 9, 8(2004).

    last updated Wednesday, December 8, 2004 12:30:37 PM.

    © 2004 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research