| The depth distribution of damage, Nd(z), in GaN implanted with 150 keV Ar+ at different implantation temperatures obtained using equation 1: RT - |
| The depth distribution of damage, Nd(z), in GaN implanted with 150 keV Ar+ at different implantation temperatures obtained using equation 1: 500 °C - + (light blue), 600 °C - |
| The depth distribution of damage, Nd(z), in GaN implanted with 150 keV Ar+ at different implantation temperatures obtained using equation 1: 700 °C - |
| The integrated damage in the bulk peak, Id, and the height of the surface peak, Hsp, as a function of the implantation temperature for two dose rates: 0.45 and 4.5µA/cm2. |