Photoluminescence in n-doped In0.1Ga0.9N/In0.01Ga0.99N multiple quantum wells
B. Monemar, P.P.Paskov, J. P. Bergman, G. Pozina, V. Darakchieva
Department of Physics and Measurement Technology, Linköping University
M. Iwaya, Satoshi Kamiyama, H. Amano, I. Akasaki
Department of Electrical and Electronic Engineering, Meijo University
and
High-Tech Research Center, Meijo University
This article was received on Tuesday, August 27, 2002 and
accepted on Monday, October 7, 2002. Abstract
In0.1Ga0.9N/In0.01Ga0.99N
multiple quantum wells (MQWs) with heavily Si-doped barriers, grown with Metal
Organic Vapor Phase Epitaxy (MOVPE) at about 8000C, have been
studied in detail with optical spectroscopy. Such structures are shown to be
very sensitive to a near surface depletion field, and if no additional layer is
grown on top of the MQW structure the optical spectra from the individual QWs
are expected to be drastically different. For a sample with 3 near surface QWs
and Si-doped barriers, only the QW most distant from the surface is observed in
photoluminescence (PL). The strong surface depletion field is suggested to
explain these results, so that the QWs closer to the surface cannot hold the
photo-excited carriers. A similar effect of the strong depletion field is found
in an LED structure where the MQW is positioned at the highly doped n-side of
the pn-junction. The internal polarization induced electric field in the QWs is
also rather strong, and incompletely screened by carriers transferred from the
doped barriers. The observed PL emission for this QW is of localized exciton
character, consistent with the temperature dependence of peak position and PL
decay time. The excitonic lineshape of 35-40 meV in the QW PL is explained as
caused by a combination of random alloy fluctuations and interface roughness;
the corresponding localization potentials are also responsible for the
localization of the excitons in the low temperature range (<150 K). These
samples show no evidence of localization due to nanoscale In fluctuations,
these commonly observed problems are concluded to be not present in our
samples. A second PL feature at lower energy, observed at low temperatures, is
shown to be related to an electron pocket at the interface to the underlying
n-GaN buffer layer in these samples.Outline
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Cite this article as: MRS Internet J. Nitride Semicond. Res. 7, 7(2002).
last updated Wednesday, December 8, 2004 4:27:52 PM.© 2002-2004 The Materials Research Society
