Compositional variation of AlGaN epitaxial films on 6H-SiC substrates determined by cathodoluminescence.


A. Petersson
Division of Solid State Physics, Lund University, Box 118, S-221 00 Lund, Sweden
and
Crystal Fibre A/S, Blokken 84, DK-3460 Birkerød, Denmark

Anders Gustafsson , L. Samuelson
Division of Solid State Physics, Lund University, Box 118, S-221 00 Lund, Sweden

Satoru Tanaka
Research Institute for Electronic Science, Hokkaido University, Kita, 12-Nishi 6, Kita-ku, Sapporo 060-0812 Japan

Yoshinobu Aoyagi
The Institute of Physical and Chemical Research (RIKEN)

This article was received on Friday, May 3, 2002 and accepted on Thursday, June 27, 2002.

Abstract

High quality epitaxial films of AlxGa1-xN, grown on SiC substrates, were investigated using spatially resolved cathodoluminescence (CL), scanning electron microscopy, and atomic force microscopy. A variation in the observed peak energy position of the CL was related to alloy fluctuations. CL was used to reveal relative alloy fluctuations of approximately 1% on a sub-micrometer scale, with a precision difficult to surpass with other available techniques. By correlating data from the different techniques, a model was derived. The main feature of it is an alloy fluctuation on the micrometer scale, seeded during the initial growth and extending through the epitaxial film. These alloy fluctuations seems to be related to terrace steps (approxequal5 nm in height), formed preferentially at scratches on the SiC surface. This investigation indicates that the initial growth of epitaxial films is critical and structures formed at the beginning of the growth tend to persist throughout the growth. Further, a strain gradient from the SiC interface extending towards the surface, was observed.

Outline

  • Introduction
  • Growth
  • Structural Properties
  • Optical Properties
  • Discussion
  • A Model for the compositional variations
  • Summary
  • Linked Pages

    Cite this article as: MRS Internet J. Nitride Semicond. Res. 7, 5(2002).

    last updated Monday, July 1, 2002 4:30:43 PM.

    © 2002 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research