Review of Structure of Bare and Adsorbate-Covered GaN(0001) Surfaces
R. M. Feenstra
Department of Physics, Carnegie Mellon University
J. E. Northrup
Palo Alto Research Center
Jörg Neugebauer
Fritz-Haber-Institut der MPG
This article was received on Friday, March 22, 2002 and
accepted on Wednesday, May 1, 2002. Abstract
A
review of surface structures of bare and adsorbate-covered GaN (0001) and
(000
)
surfaces is presented, including results for In, Mg, Si, and H adsorbates.
Emphasis is given to direct determination of surface structure employing
experimental techniques such as scanning tunneling microscopy, electron
diffraction, and Auger electron spectroscopy, and utilizing first principles
computations of the total energy of various structural models. Different
surface stoichiometries are studied experimentally by varying the surface
preparation conditions (e.g. Ga-rich compared to N-rich), and the stoichiometry
is included in the theory by performing calculations for various chemical
potentials of the constituent atoms. Based on the work reviewed here, surface
reconstructions for plasma-assisted molecular beam epitaxy growth of GaN (0001)
and (000
)
surfaces are fairly well understood, but reconstructions for reactive molecular
beam epitaxy or for metal-organic vapor phase epitaxy (both involving H, at
moderate and high temperatures, respectively) are less well understood at
present.Outline
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Cite this article as: MRS Internet J. Nitride Semicond. Res. 7, 3(2002).
last updated Wednesday, February 11, 2004 12:06:46 PM.© 2002-2004 The Materials Research Society
