Tables

Table I

 Resistances as a function of distance of ohmic pads for both HCl-treated and plasma-treated samples.

Distance (µm)

HCl-treated (Omega)

Plasma-treated (Omega)

3

2.14 x 106

0.88

6

2.30 x 106

1.12

9

2.78 x 106

1.28

12

3.11 x 106

1.44

15

3.56 x 106

1.65

18

3.82 x 106

1.88

Table II

 FWHMs of the Ga-O bonds with the type of surface treatment

Sample

As-grown

HCl

ICP

ICP+HCl

FWHM (eV)

0.97

0.96

0.83

0.77 

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last updated Wednesday, April 11, 2001 8:05:41 PM.

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