Photoluminescence and Cathodoluminescence of GaN Doped With Pr


Henryk J. Lozykowski, Wojciech Jadwisienczak
Ohio University

I. Brown
Lawrence Berkeley Laboratory

This article was presented as part of Symposium W, "Gallium Nitride and Related Alloys" at the 1999 Fall Meeting of the Materials Research Society held in Boston, Massachusetts, November 28-December 3

Abstract

In this paper we have reported the observation of visible photoluminescence (PL) and cathodoluminescence (CL) of Pr implanted in GaN. The implanted samples were given isochronal thermal annealing treatments at a temperature of 1100 °C in NH3, N2, Ar2, and in forming gas N2 +H2, at atmospheric pressure to recover implantation damages and activate the rare earth ions. The sharp characteristic emission lines corresponding to Pr3+ intra-4fn -shell transitions are resolved in the spectral range from 350 nm to 1150 nm, and observed over the temperature range of 12 K-335 K. The PL and CL decay kinetics measurement was performed for 3P1, 3P0 and 1D2 levels.

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Cite this article as: MRS Internet J. Nitride Semicond. Res. 5S1, W11.64 (2000).


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MRS Internet Journal of Nitride Semiconductor Research
last updated Wednesday, May 17, 2000 5:01:11 PM.
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