Figure 17

Nitride etch rates (top) and etch selectivities for InN/AlN and InN/GaN (bottom in BI3/Ar or BBr3/Ar discharges (750 W source power, 5 mTorr) as a function of the boron halide content.


top        text     Figure 16     Figure 18        endnotes

last updated Wednesday, November 22, 2000 3:01:22 PM.

© 2000 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research