Figures

Figure 1

AFM image and RHEED pattern after one-hour nitridation at 100 °C [(a) and (b)].


Figure 2

AFM image and RHEED pattern after one-hour nitridation at 200 °C [(a) and (b)].


Figure 3

AFM image and RHEED pattern after one-hour nitridation at 700 °C [(a) and (b)].


Figure 4

Surface roughness after one-hour nitridation and GaN bulk growth as a function of temperature.


Figure 5

FWHM of the X-ray rocking curves for the symmetric and asymmetric reflections of 0.9µm-GaN bulk.


Figure 6

AFM images after the 0.9µm-GaN bulk growth at (a) 100°C, (b) 200°C for one-hour nitridation.


Figure 7

AFM images after the 0.9µm-GaN bulk growth at (a) 300°C, (b) 400°C for one-hour nitridation.


Figure 8

AFM image after the 0.9µm-GaN bulk growth at 700°C for one-hour nitridation.


top        text        endnotes

last updated Monday, November 6, 2000 5:02:42 PM.

© 2000 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research