Characterization of InGaN/GaN-Based Multi-Quantum Well Distributed Feedback Lasers


Daniel Hofstetter
University of Neuchatel

Robert L. Thornton
MAXTEK Components Corporation

Linda T. Romano, David P. Bour, Michael Kneissl, Rose M. Donaldson
Xerox Palo Alto Research Center

Clarence Dunnrowicz
XeroxPalo Alto Research Center

This article was presented as part of Symposium G, "Gallium Nitride and Related Alloys" at the 1998 Fall Meeting of the Materials Research Society held in Boston, Massachusetts, November 30-December 4.

Abstract

We present a device fabrication technology and measurement results of both optically pumped and electrically injected InGaN/GaN-based distributed feedback (DFB) lasers operated at room temperature. For the optically pumped DFB laser, we demonstrate a complex coupling scheme for the first time, whereas the electrically injected device is based on normal index coupling. Threshold currents as low as 1.1 A were observed in 500 µm long and 10 µm wide devices. The 3 rd order grating providing feedback was defined holographically and dry-etched into the upper waveguiding layer by chemically-assisted ion beam etching. Even when operating these lasers considerably above threshold, a spectrally narrow emission (3.5 Å) at wavelengths around 400 nm was seen.

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Cite this article as: MRS Internet J. Nitride Semicond. Res. 4S1, G2.2 (1999).


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MRS Internet Journal of Nitride Semiconductor Research
last updated Saturday, April 3, 1999 2:35:31 AM.
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