Visible-Blind UV Digital Camera Based On a 32 x 32 Array of GaN/AlGaN p-i-n Photodiodes


J.D. Brown, Zhonghai Yu, J. Matthews, S. Harney, J. Boney, J.F. Schetzina
Department of Physics, North Carolina State University

J.D. Benson, K.W. Dang, C. Terrill
Night Vision Laboratory, Ft. Belvoir, VA

Thomas Nohava, Wei Yang, Subash Krishnankutty
Honeywell Technology Center

This article was received on Wednesday, August 25, 1999 and accepted on Friday, September 3, 1999.

Abstract

A visible-blind UV camera based on a 32 x 32 array of backside-illuminated GaN/AlGaN p-i-n photodiodes has been successfully demonstrated. Each of the 1024 photodiodes in the array consists of a base n-type layer of AlGaN (~20%) onto which an undoped GaN layer followed by a p-type GaN layer is deposited by metallorganic vapor phase epitaxy. Double-side polished sapphire wafers are used as transparent substrates. Standard photolithographic, etching, and metallization procedures were employed to obtain fully-processed devices. The photodiode array was hybridized to a silicon readout integrated circuit using In bump bonds. Output from the UV camera was recorded at room temperature at a frame rate of 30 Hz. This new type of visible-blind digital camera is sensitive to radiation from 320 nm to 365 nm in the UV spectral region.

Outline

  • Introduction
  • Properties of Semiconductor Photodiodes
  • Experimental Details
  • Results and Discussion
  • Discrete GaN/AlGaN p-i-n Heterostructure Photodiode
  • GaN/AlGaN 32 x 32 Photodiode Array
  • Summary and Conclusions.
  • Acknowledgments
  • Linked Pages

    Cite this article as: MRS Internet J. Nitride Semicond. Res. 4, 9(1999).

    last updated Friday, November 3, 2000 4:09:27 PM.

    © 1999-2000 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research