Fabrication and Characterization of GaN/AlGaN Ultraviolet-Band Heterojunction Photodiodes


Subash Krishnankutty, Wei Yang, Thomas Nohava
Honeywell Technology Center

P. Paul Ruden
Department of Electrical Engineering, University of Minnesota

This article was received on Monday, January 26, 1998 and accepted on Tuesday, April 7, 1998.

Abstract

Results from MOCVD grown n-Al0.1Ga0.9N/i-GaN/p-GaN UV photodetectors on sapphire substrates are presented. The devices show peak responsivities near 0.2A/W for wavelengths between 352nm and 362nm, and responsivities of less than 10-3A/W for wavelengths longer than 375nm and shorter than 342nm. The data is explained in terms of a simple device model.

Outline

  • Introduction
  • Device Fabrication
  • Results and Discussion
  • Conclusions
  • Acknowledgments
  • Linked Pages

    Cite this article as: MRS Internet J. Nitride Semicond. Res. 3, 7(1998).

    last updated Thursday, April 9, 1998 2:43:39 PM.

    © 1998 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research
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