Current status of GaN crystal growth by sublimation sandwich technique
P. G. Baranov, E. N. Mokhov, A. O. Ostroumov, M. G. Ramm, M. S. Ramm, V. V. Ratnikov, A. D. Roenkov, Yu. A. Vodakov, A. A. Wolfson
Ioffe Physical-Technical Institute
G. V. Saparin
Moscow State Lomonosov University
S. Yu. Karpov, D. V. Zimina
Soft-Impact Ltd (St.Petersburg, Russia)
Yu. N. Makarov
Lehrstuhl für Strömungsmechanik, University of Erlangen-Nürnberg
Holger Juergensen
AIXTRON AG
This article was received on Monday, August 31, 1998 and
accepted on Monday, November 2, 1998. Abstract
The
current status of GaN crystal growth using the Sublimation Sandwich Technique
is discussed in the paper. We use modeling to analyze gas dynamics in the
reactor and the supply of the main gaseous species into the growth cell under
growth conditions used in experiments. Important features of growth process
-- non-equilibrium cracking of ammonia, partial sticking of ammonia at the
growing surface and kinetic limitation of GaN thermal decomposition -- are
taken into account in the model. Growth is carried out on sapphire and 6H-SiC
substrates in ammonia atmosphere using a Ga/GaN mixture as the group-III element
source. Single crystals of GaN of size 15x15 mm and up to 0.5 mm
thick are normally grown with the optimized growth rates of 0.25-0.35 mm/h. The
GaN crystals are characterized by photoluminescence, by the Color
Cathodoluminescence Scanning Electron Microscopy technique, by differential
double-crystal and triple-crystal X-ray diffractometry, and by electron
paramagnetic resonance. Mechanisms of sublimation growth of GaN and physical
limitations of the growth process are discussed. Outline
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Cite this article as: MRS Internet J. Nitride Semicond. Res. 3, 50(1998).
last updated Wednesday, November 4, 1998 2:49:08 PM.© 1998 The Materials Research Society
