Figure 2a

Mask with star shaped pattern, with stripes opened at 5° angular increment to determine optimal stripe orientation and differences in lateral growth rates.


(click for full image)

Figure 2b

Areas of parallel stripes. (top: SEM top view of mask, bottom: stripe/mask widths)


(click for full image)
top        text     Figure 1     Figure 3        endnotes

last updated Friday, September 17, 1999 4:45:36 AM.

© 1998-1999 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research