Magneto-optical studies of shallow donors in MOCVD grown GaN layers in FIR


A. M. Witowski, M. L. Sadowski
Institute of Experimental Physics, Warsaw University
and
Grenoble High Magnetic Field Laboratory MPI CNRS

K. Pakula, B. Suchanek, R. Stepniewski, Jacek M. Baranowski
Institute of Experimental Physics, Warsaw University

M. Potemski, G. Martinez, P. Wyder
Grenoble High Magnetic Field Laboratory MPI CNRS

This article was received on Wednesday, June 24, 1998 and accepted on Wednesday, October 7, 1998.

Abstract

Far infrared magnetooptical investigations of shallow donors in epitaxial MOCVD GaN layers show two types of shallow donors. In relaxed layers, a donor with an ionization energy of 35 meV was found. In strained, undoped and Si doped samples, a donor with ionization energy 32.5 meV was observed. From the p state splitting in magnetic field, the cyclotron effective mass for conduction electrons was found to be m*=0.222 m0.

Outline

  • Introduction
  • Experimental results
  • Theoretical description
  • Conclusions
  • Acknowledgments
  • Linked Pages

    Cite this article as: MRS Internet J. Nitride Semicond. Res. 3, 33(1998).

    last updated Wednesday, October 7, 1998 11:04:00 PM.

    © 1998 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research
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