| High-resolution SEM image of a GaN layer grown at N-rich conditions. Trenches can be seen on the surface, however, the area in between is smooth. |
| High-resolution SEM image of a GaN layer grown at N-rich conditions. Both the layer surface and the GaAs substrate are shown, where part of the layer has been peeled off. |
| High-resolution SEM image of a GaN layer grown under Ga-rich conditions. The excess Ga has formed droplets which are trapped in trenches. |
| High-resolution SEM image of a GaN layer grown under Ga-rich conditions. The removal of the Ga-droplets revealed nano-crystallites on the walls and edges of the trenches. |
| High-resolution SEM image of a GaN layer grown at near-stoichiometric conditions. The estimated surface roughness is ~20 nm, as determined by the nano-crystalline grains. |
| AFM image of a GaN layer grown at near-stoichiometric conditions. The characterised area of 1 µm2 confirms the good surface roughness of ~20 nm or better, as was estimated by high-resolution SEM. |