MIJ-NSR Vol. 2, Art. 46, M. Meyyappan

Characteristics of an Electron Cyclotron Resonance Plasma Source for the Production of Active Nitrogen Species in III-V Nitride Epitaxy

This article was received on November 25, 1997 and accepted on December 11, 1997.

Abstract

A simple analysis is provided to determine the characteristics of an electron cyclotron resonance (ECR) plasma source for the generation of active nitrogen species in the molecular beam epitaxy of III-V nitrides. The effects of reactor geometry, pressure, power, and flow rate on the dissociation efficiency and ion flux are presented. Pulsing the input power is proposed to reduce the ion flux.

Outline

Introduction

Analysis

ECR nitrogen discharge characteristics

Pulsed-power nitrogen discharge

Concluding Remarks

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Cite this article as: MRS Internet J. Nitride Semicond. Res. 2, 46(1997).

last updated December 11, 1997 2:09:17 PM.