Aluminum Nitride-Silicon Carbide Alloy Crystals Grown on SiC Substrates by Sublimation
Z. Gu, L. Du, J.H. Edgar
Department of Chemical Engineering, Kansas State University
E.A. Payzant, L. Walker
Oak Ridge National Laboratory, High Temperature Materials Laboratory
R. Liu
Department of Physics and Astronomy, Arizona State University
M.H. Engelhard
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory
This article was received on Monday, November 28, 2005 and
accepted on Monday, December 19, 2005. Abstract
AlN-SiC
alloy crystals, with a thickness greater than 500 µm, were grown on 4H-
and 6H-SiC substrates from a mixture of AlN and SiC powders by the
sublimation-recondensation method at 1860-1990 °C. On-axis SiC
substrates produced a rough surface covered with hexagonal grains, while 6H-
and 4H- off-axis SiC substrates with different miscut angles (8° or
3.68°) formed a relatively smooth surface with terraces and steps. The
substrate misorientation ensured that the AlN-SiC alloy crystals grew two
dimensionally as identified by scanning electron microscopy (SEM). X-ray
diffraction (XRD) and transmission electron microscopy (TEM) confirmed that the
AlN-SiC alloys had the wurtzite structure. Electron probe microanalysis (EPMA)
and x-ray photoelectron spectroscopy (XPS) demonstrated that the resultant
alloy crystals had non-stoichiometric ratios of Al:N and Si:C and a uniform
composition throughout the alloy crystal from the interface to the surface. The
composition ratio of Al:Si of the alloy crystals changed with the growth
temperature, and differed from the original source composition, which was
consistent with the results predicted by thermodynamic calculation of the
solid-vapor distribution of each element. XPS detected the bonding between
Si-C, Si-N, Si-O for the Si 2p spectra. The dislocation density
decreased with the growth, which was lower than 106 cm-2
at the alloy surface, more than two orders of magnitude lower compared to
regions close to the crystal/substrate interface, as determined by
TEM.Outline
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Cite this article as: MRS Internet J. Nitride Semicond. Res. 10, 5(2005).
last updated Thursday, January 5, 2006 6:44:20 PM.© 2005-2006 The Materials Research Society
