Yellow Band and Deep levels in Undoped MOVPE GaN.


F. J. Sánchez, D. Basak, M. A. Sánchez-García, E. Calleja, E. Muñoz, I. Izpura, F. Calle, J. M. G. Tijero
Dpt. Ingeniería Electrónica, E.T.S.I. Telecomunicación, Politécnica, Ciudad Universitaria

B. Beaumont, P. Lorenzini, Pierre Gibart
Centre de Recherche sur l'Hetero-Epitaxie et ses Applications, CRHEA-CNRS

T. S. Cheng, C. T. Foxon
Department of Physics, University of Nottingham

J. W. Orton
Department of Electrical and Electronic Engineering, University of Nottingham

This article was received on June 4, 1996 and accepted on September 9, 1996.

Abstract

Undoped layers of GaN grown by MOVPE on sapphire substrates have been characterized by photoluminescence, photocapacitance and photoinduced current transient spectroscopy (PICTS). Photocapacitance reveals in all samples two specific signatures at photon energies of 1 eV and 2.5 eV. The photocapacitance decrease observed at 1 eV seems to be due to an electron capture process from the valence band, whereas the capacitance increase at 2.5 eV is related to an electron emission process. The fact that the capacitance step at 1 eV is only seen after photoionization at energies above 2.5 eV, and the observed correlation between its amplitude and the photoluminescence intensity of the "yellow band", lead us to conclude that both transitions are linked to the same trap, which is also suggested to be responsible for the yellow band. The position of this trap, at 2.5 eV below the conduction band, is confirmed by PICTS measurements, that show a hole thermal emission activation energy of 0.9 eV at 350 K.

Outline

  • Introduction
  • Experimental
  • Acknowledgments
  • Linked Pages

    Cite this article as: MRS Internet J. Nitride Semicond. Res. 1, 7(1996).

    last updated October 29, 1997 10:22:22 AM.

    © 1996-1997 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research
    ISBN links