GaN Based p-n Structures Grown on SiC Substrates


V.A. Dmitriev
Cree Research, Inc.

This article was received on June 4, 1996 and accepted on October 30, 1996.

Abstract

Wide band gap nitrides(InN, GaN, AlN) have been considered promising optoelectronics materials for many years [1]. Recently two main technological problems in the nitrides were overcome: (1)high quality layers has been grown on both sapphire and SiC substrates and(2) p-type GaN and AlGaN material has been obtained. These achievements resulted in the fabrication of bright light emitters in the violet, blue and green spectral regions [2].First injection laser has been demonstrated [3]. This paper reviews results obtained over the last few years on nitride p-n junctions, particularly on GaN based p-n junctions grown on SiC substrates. We will consider GaN p-n junctions, AlGaN p-n junctions, GaN and AlGaN p-i-n structures, and, finally, GaN/SiC p-n structures.

Outline

  • Introduction
  • GaN p-n junctions
  • Linearly graded GaN p-n junctions
  • C-V characteristics
  • Forward I-V characteristics
  • Reverse I-V characteristics
  • Abrupt GaN p-n junctions
  • C-V characteristics
  • I-V characteristics
  • Electroluminescence of GaN p-n junctions
  • AlGaN p-n junctions
  • GaN and AlGaN p-i-n structures
  • C-V characteristics
  • I-V characteristics
  • n-GaN/p-SiC heterojunctions
  • Linked Pages

    Cite this article as: MRS Internet J. Nitride Semicond. Res. 1, 29(1996).

    last updated October 29, 1997 1:17:37 PM.

    © 1996-1997 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research
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