Growth of Ga-face and N-face GaN films using ZnO Substrates


E. S. Hellman, D. N. E. Buchanan, D. Wiesmann, I. Brener
Bell Laboratories, Lucent Technologies

This article was received on Sunday, June 2, 1996 and accepted on Thursday, October 10, 1996.

Abstract

We have used plasma molecular beam epitaxy on (0 0 0 1) and (0 0 0 (-1)) ZnO substrates to induce epitaxial growth of GaN of a known polarity. The polarity of the ZnO substrates can be easily and unambiguously determined by measuring the sign of the piezoelectric coefficient. If we assume that N-face GaN grows on O face ZnO and that Ga-face GaN grows on Zn face ZnO, then we can study the growth of both Ga and N faces. The most striking difference is the doping behavior of the two faces. Growth on the Ga-face is characterized by a higher carrier concentration and a lower threshold for Ga droplet formation.

Outline

  • Introduction
  • Experimental Details and Growth
  • Substrate Preparation
  • MBE Growth
  • Characterization
  • Discussion
  • Droplets
  • Impurities and Defects
  • Conclusions
  • Acknowledgments
  • Linked Pages

    Cite this article as: MRS Internet J. Nitride Semicond. Res. 1, 16(1996).

    last updated Tuesday, February 10, 2004 5:02:19 PM.

    © 1996-2004 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research