ScAlMgO4: an Oxide Substrate for GaN Epitaxy


E. S. Hellman, C. D. Brandle, L. F. Schneemeyer, D. Wiesmann, I. Brener, T. Siegrist, G. W. Berkstresser, D. N. E. Buchanan, E. H. Hartford
AT&T Bell Laboratories

This article was received on Thursday, September 14, 1995 and accepted on Tuesday, January 16, 1996.

Abstract

We report the use of ScAlMgO4 as a substrate for the epitaxial growth of wurzitic GaN. The low misfit (+1.8%) allows coherent epitaxy of GaN, as observed by RHEED. The congruent melting of ScAlMgO4 makes Czochralski growth possible, suggesting that large, high quality substrates can be realized. Boules about 17mm in diameter are reported. We have used nitrogen-plasma molecular beam epitaxy to grow GaN epitaxial films onto ScAlMgO4 substrates. Band-gap photoluminescence has been observed from some of these films, depending primarily on the deposition conditions. A 3x3 superstructure has been observed by RHEED on the GaN surfaces. Structural analysis by x-ray diffraction indicates very good in-plane alignment of the GaN films. We also report thermal expansion measurements for ScAlMgO4.

Outline

  • Introduction
  • Sapphire: The Standard of Comparison
  • Alternatives to Sapphire
  • 6H-SiC
  • ZnO
  • MgO
  • Spinel
  • YbFe2O4 structure
  • Preparation and Characterization of ScAlMgO4 Crystals
  • Micaceous Platelets
  • Czochralski Boules
  • Thermal Expansion of ScAlMgO4
  • GaN Epitaxial Growth
  • GaN Film Characterization
  • X-ray Diffraction
  • Optical Transmittance
  • Photoluminescence
  • Discussion
  • Stacking faults
  • Lattice Matching to Alloys
  • Conclusion
  • Acknowledgments
  • Linked Pages

    Cite this article as: MRS Internet J. Nitride Semicond. Res. 1, 1(1996).

    last updated Wednesday, September 9, 1998 2:42:52 AM.

    © 1996-1998 The Materials Research Society MRS Internet Journal of Nitride Semiconductor Research
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